Caltech Nanofabrication Group

  • Increase font size
  • Default font size
  • Decrease font size
Home Research Nanofabrication

Fluoride Etch Masks for High-Resolution Pattern Transfer

Research Area: Nanofabrication Year: 1989
Type of Publication: Article Keywords: Nanofabrication, dry etching, plasma, etch masks, fluorides
Authors: Axel Scherer; B. P. Van der Gaag; E. D. Beebe; P. S. D. Lin
Journal: Journal of Vacuum Science and Technology B Volume: 8
Number: 1 Pages: 28-32
Month: January
Abstract:
We use thermally evaporated fluoride films as dry etch masks to fabricate sub-100 nm wide features into III–V heterostructures. Fluorides are compatible with lift-off processing and display excellent resistance to halide etch gas mixtures. Among the advantages which these materials offer over conventional metal masks are their thermal stability, good adhesion, high resistivity, the avoidance of "flags" arising from angle evaporation, and the ease with which they can be removed from the surface. By adjusting the composition of these fluorides and thereby controlling their grain size, we can optimize the resolution and erosion rates of our masks and fabricate structures with lateral sizes below 20 nm.
Full text:
PDF: Caltech only
Online version (publisher)

Contact

Administrative and Financial Contact

Kate Finigan
MC 200-36, Caltech
1200 E California Blvd
Pasadena, CA 91125

Office:  212 Sloan Annex
Phone:  626.395.4585
Fax: 626.577.8442
Email: kate@caltech.edu

Login