Caltech Nanofabrication Group

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Home Research Nanofabrication

Fabrication of Ultrasmall Magnets by Electroplating

Research Area: Nanofabrication Year: 1995
Type of Publication: Article Keywords: aspect ratio, electrodeposition, magnetic storage devices, nickel, lithography, nanostructures
Authors: W. Xu; Joyce Wong; Chuan-Cheng Cheng; R. Johnson; Axel Scherer
Journal: Journal of Vacuum Science and Technology B Volume: 13
Number: 6 Pages: 2372-2375
Month: November
We use high voltage electron beam lithography followed by electroplating to define small metal features on semiconductor substrates. These have been used to form high resolution etch masks, dense nanomagnet arrays, and highly anisotropic metal nanostructures. To reproducibly obtain uniform arrays of such structures, we have developed an end-point detection technique, which is based on in situ observation of the electrodeposition process.
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