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Fabrication of High-Density Nanostructures by Electron Beam Lithography

Research Area: Nanofabrication Year: 1998
Type of Publication: Article Keywords: electron beam lithography, nanotechnology
Authors: Dial, O.; Cheng, Chuan-Cheng; Scherer, Axel
Journal: Journal of Vacuum Science and Technology B Volume: 16
Number: 6 Pages: 3887-3890
Month: November
We demonstrate a fabrication method to define high-density, uniform nanostructures by electron beam lithography at conventional beam voltages (positive resist and isopropyl alcohol as a developer. Arrays of 12 nm dots with 25 nm period and 20 nm lines with 40 nm period were fabricated to show the resolution of this optimized process.
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