Caltech Nanofabrication Group

  • Increase font size
  • Default font size
  • Decrease font size
Home Publications

Fabrication of High-Density Nanostructures by Electron Beam Lithography

Research Area: Nanofabrication Year: 1998
Type of Publication: Article Keywords: electron beam lithography, nanotechnology
Authors: Dial, O.; Cheng, Chuan-Cheng; Scherer, Axel
Journal: Journal of Vacuum Science and Technology B Volume: 16
Number: 6 Pages: 3887-3890
Month: November
Abstract:
We demonstrate a fabrication method to define high-density, uniform nanostructures by electron beam lithography at conventional beam voltages (positive resist and isopropyl alcohol as a developer. Arrays of 12 nm dots with 25 nm period and 20 nm lines with 40 nm period were fabricated to show the resolution of this optimized process.
Full text:
PDF: Caltech only
Online version (publisher)

Contact

Administrative and Financial Contact

Kate Finigan
MC 200-79, Caltech
1200 E California Blvd
Pasadena, CA 91125

Office:  215 Powell-Booth
Phone:  626.395.4585
Fax: 626.577.8442
Email: kate@caltech.edu

Login